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Magnetron sputtering equipment Product List and Ranking from 8 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

Magnetron sputtering equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. テルモセラ・ジャパン 本社 Tokyo//Industrial Electrical Equipment
  2. 真空デバイス 本社 Ibaraki//Pharmaceuticals and Biotechnology
  3. ティー・ケイ・エス Tokyo//Electronic Components and Semiconductors
  4. 4 コメット Ibaraki//Other manufacturing
  5. 5 ハイテック・システムズ Kanagawa//Industrial Machinery
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Magnetron sputtering equipment Product ranking

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. 【nanoPVD-S10A】Magnetron Sputtering Device テルモセラ・ジャパン 本社
  2. Magnetron sputtering device for high-precision optical filter film deposition ティー・ケイ・エス
  3. Ultra-compact Magnetron Sputtering Device MSP-mini 真空デバイス 本社
  4. Magnetron Sputtering Device MSP-1S 真空デバイス 本社
  5. 4 Magnetron Sputtering Device MSP-20UM 真空デバイス 本社

Magnetron sputtering equipment Product List

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Ultra-compact Magnetron Sputtering Device MSP-mini

Ultra-compact Magnetron Sputtering Device MSP-mini

This is a metal coating device for optical microscope samples (transparent materials) or SEM samples. It is the smallest model in the industry. It is a super compact coating device.

The coating is done at a very low voltage using a magnetron electrode. A simple yet highly glossy metal film can be coated with just one touch. Set the sample. Set the timer according to the desired coating thickness. Once you press the start button, it automatically progresses from preliminary evacuation to coating. When the coating is complete, the RP stops and automatically air leaks.

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Magnetron Sputtering Device MSP-20UM

Magnetron Sputtering Device MSP-20UM

To apply a conductive film treatment to the sample for the electron microscope. Magnetron sputtering device.

The Magnetron Sputtering Device MSP-20UM is a device used for applying conductive film treatment to samples for electron microscopy. It employs a magnetron target to minimize sample damage. It is equipped with adjustment functions that allow it to accommodate various applications. It also has features for introducing and adjusting the pressure of argon gas and other gases, which contributes to improving film purity. For more details, please contact us or refer to the catalog.

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Magnetron Sputtering Device MSP-1S

Magnetron Sputtering Device MSP-1S

For SEM samples. It is a sample-friendly magnetron-type ion coater.

The Magnetron Sputtering Device MSP-1S allows for coating at low voltage and features a floating sample stage, ensuring no damage to the samples. It is a magnetron-type ion coater that is gentle on samples. Its compact size means it doesn't take up much space and can operate in a corner of your desk. For more details, please contact us or refer to the catalog.

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Magnetron Sputtering Device MSP-20TK

Magnetron Sputtering Device MSP-20TK

It is a coating device for tungsten thin films for electron microscopes.

The Magnetron Sputtering Device MSP-20-TK is a tungsten coating device for applying conductive treatment to electron microscope samples. By adopting a magnetron target, it minimizes sample damage. For more details, please contact us or refer to the catalog.

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Three-Element Magnetron Sputtering Device 'NS-023'

Three-Element Magnetron Sputtering Device 'NS-023'

Development of new thin films using simultaneous three-source sputtering! Customizable according to experimental content and budget.

The NS-023 is a ternary magnetron sputtering device capable of simultaneously depositing three types of targets. In addition to multi-target simultaneous sputtering, it supports various applications by adopting a platinum heater for high-temperature activation of the substrate (heater temperature: 950°C) and reactive sputtering. Additionally, it can accommodate assist plasma sources (ECR, ICP, etc.). 【Features】 ■ Capable of simultaneously depositing three types of targets ■ Supports various applications beyond multi-target simultaneous sputtering ■ Customizable according to experimental content and budget ■ Compatible with assist plasma sources *For more details, please refer to the PDF document or feel free to contact us.

  • Sputtering Equipment

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Magnetron Sputtering Device "LA-S2020"

Magnetron Sputtering Device "LA-S2020"

Magnetron sputtering equipment that can also be made as a film thickness electrode for various devices and sensors.

Labotech Co., Ltd.'s "LA-S2020" is a 2-inch magnetron DC sputtering device with a counter-parallel disk type. It allows for metal (Au/Pt, etc.) coating when observing non-conductive samples using a scanning electron microscope (SEM). This sputtering device can produce thin film electrodes (below 50nm) for various devices and sensors. It achieves efficient glow discharge with simple operations in a short time, enabling the production of sputtered films with excellent granularity. 【Features】 ■ Easy operation ■ High efficiency ■ Low cost *For more details, please contact us or download the catalog.

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Magnetron sputtering device for high-precision optical filter film deposition

Magnetron sputtering device for high-precision optical filter film deposition

The "FHR.Star.600-EOSS" is a high-performance magnetron sputtering device developed for precise optical filter film deposition.

We will demonstrate our capabilities in the stable production of high-performance optical filters that require multilayering and high reproducibility, such as LiDAR applications, which are expected to see significant demand in the future. - Film formation that eliminates the effects of film quality changes due to target wear using a cylindrical cathode - Stable film formation of oxide films using a reactive ion source - Film formation of a wide range of multilayer films with up to four cathodes This is a device specialized for high-quality optical thin film deposition. Features: ■ Outstanding reproducibility of optical multilayer films ■ Excellent film thickness uniformity ■ Improvement of film quality and defect-free deposition through the combination of cylindrical cathodes and sputter-up ■ Continuous monitoring of the film formation state through in-situ monitoring ■ Fully automated process control *For more details, please refer to the PDF document or feel free to contact us.

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  • Sputtering Equipment

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Combinatorial Magnetron Sputtering System CMS-6420

Combinatorial Magnetron Sputtering System CMS-6420

Effective area of a 25mm side triangle! It forms a composition distribution of hundreds of conditions on a single substrate.

The "CMS-6420" is a 6-component combinatorial magnetron sputtering device developed to expand the film deposition area, which has been difficult to achieve with the PLD method. The effective area is a triangle with sides of 25mm. Since it uses a 4-inch wafer as the standard substrate, it can be integrated into subsequent processes such as patterning and etching, enabling high throughput not only for film deposition but also for analysis. 【Features】 ■ Compatible with 4-inch wafers suitable for process lines ■ Effective area: triangle with sides of 25mm ■ Supports binary and ternary combinatorial film deposition ■ LabVIEW recipe input and automatic film deposition ■ Maximum 6-component configuration (6 units of 2-inch cathodes for matrix use) *For more details, please refer to the PDF document or feel free to contact us.

  • Sputtering Equipment

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Tabletop Magnetron Sputtering Device "FDS/FRS Series"

Tabletop Magnetron Sputtering Device "FDS/FRS Series"

Reduce initial implementation costs and enable high performance through expansion! Upgrade according to the research stage.

The "FDS/FRS Series" is a tabletop magnetron sputtering device for research and development, equipped with the necessary functions. The basic specifications consist of a DC sputter/single cathode/rotary pump configuration for metal thin film sputtering. With expansion options such as RF conversion, additional cathodes, and turbo molecular pump specifications, it is possible to upgrade according to the research stage. 【Features】 ■ Keeps initial introduction costs low while allowing for high performance upgrades later ■ Comes with an MFC for argon in the basic specifications, enabling precise control of gas flow ■ Adopts a deposition-up method to prevent dust from adhering to the sample during film formation ■ Utilizes a high vacuum-sealing SUS chamber despite being a tabletop type *For more details, please refer to the PDF materials or feel free to contact us.

  • Sputtering Equipment

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Magnetron Sputtering Device 'scia Magna 200'

Magnetron Sputtering Device 'scia Magna 200'

Maximum 200mm diameter substrate! Double ring magnetron (Fraunhofer FEP)

The "scia Magna 200" is a magnetron sputtering device with a rotating single magnetron. Applications include temperature compensation films (SiO2) for TC-SAW, piezoelectric films such as AlN, high and low refractive index films for optics, and insulating films (Si3N4, SiO2, Al2O3). Additionally, the process is magnetron sputtering. Please feel free to consult us when needed. 【Features】 ■ Maximum substrate diameter of 200mm ■ Rotating single magnetron (maximum diameter of 300mm) ■ Confocal 4 magnetron ■ Double ring magnetron (Fraunhofer FEP) *For more details, please refer to the PDF document or feel free to contact us.

  • Sputtering Equipment

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【nanoPVD-S10A】Magnetron Sputtering Device

【nanoPVD-S10A】Magnetron Sputtering Device

High-performance, cost-effective RF/DC magnetron sputtering system for research and development.

High-Performance RF/DC Magnetron Sputtering Equipment ● Achievable pressure: 5 x 10^-5 Pa (*1 x 10^-4 Pa in the fastest 30 minutes!) ● Sputter cathodes x 3: Automatic continuous multilayer film, simultaneous deposition from 2 sources ● Film uniformity ±3% ● Various options: Substrate rotation and elevation, substrate heating (Max 500℃), cathodes for magnetic materials, and more ◉ nanoPVD can be used for various purposes, including up to 3 sputter sources + 3 systems (MFC control), expansion of RF/DC PSU (up to 2 power supplies), continuous multilayer film, and simultaneous deposition from 2 sources (RF/DC or DC/DC only). - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: Up to Φ4 inch ◉ 2" cathodes x up to 3 sources ◉ 7" touch panel for easy operation with PLC automatic process control ◉ APC automatic pressure control ◉ High-precision process control with MFC ◉ 1 Ar gas system (standard) + N2, O2 expandable up to 3 systems ◉ USB port for connection to Windows PC, allowing the creation and storage of recipes for up to 1000 layers and 50 films. Data logging on PC ◉ Other various options available

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Magnetron Sputtering Device MSP-20MT

Magnetron Sputtering Device MSP-20MT

The target is a 4-inch size that can coat large samples as they are.

The Magnetron Sputtering Device MSP-20MT is a coating device for applying conductive treatment to electron microscope samples. It uses a magnetron target to minimize sample damage. It is designed for a 4-inch target size and can process large samples or multiple samples at once. For more details, please contact us or refer to the catalog.

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Magnetron sputtering device MSP-8 inch

Magnetron sputtering device MSP-8 inch

Equipped with a large-area sample stage compatible with 8-inch wafers.

The Magnetron Sputtering Device MSP-8 Inch features a magnetron target electrode and is equipped with a large-area sample stage compatible with 8-inch wafers. The variation in coating thickness is within 10%, effectively utilizing the entire stage area. Coating is done at a voltage of 500V or lower to reduce damage from ion impact. For more details, please contact us or refer to the catalog.

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Magnetron Sputtering Device MSP-40T

Magnetron Sputtering Device MSP-40T

Multipurpose, fully automatic film deposition device for experimental use. Magnetron sputtering device MSP-40T type.

The Magnetron Sputtering Device MSP-40T is a multipurpose, multi-metal, experimental ion sputtering deposition system. It features an electrode-separated sample stage to avoid sample damage, efficient deposition with high-speed exhaust and simple operation, and offers good cost performance at a low price. As a successor to the MSP-30T, it has been upgraded with full auto-coating, a touch panel, and recipe functions. For more details, please contact us or refer to the catalog.

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Combinatorial Magnetron Sputtering System CMS-3200

Combinatorial Magnetron Sputtering System CMS-3200

A composition distribution with several hundred conditions is formed on a single substrate. The effective film formation area is an equilateral triangle with a side length of 25 mm.

The "CMS-3200" is a three-component combinatorial magnetron sputtering device that supports binary and ternary combinatorial composition gradient film deposition. The effective area is an equilateral triangle with a side length of 25mm. It is designed to use 2-inch wafers as standard substrates, allowing for integration into post-processing steps such as patterning and etching, enabling high throughput not only for film deposition but also for analysis. 【Features】 ■ Supports binary and ternary combinatorial composition gradient film deposition ■ Effective film deposition area: equilateral triangle with a side length of 25mm ■ Equipped with three 2-inch magnetron sputter cathodes ■ Can accommodate up to six RF and DC power supplies in three sets ■ Recipe editing and fully automated combinatorial film deposition using LabView *For more details, please refer to the PDF document or feel free to contact us.

  • Sputtering Equipment

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